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About HRL

At the Hovish Research Laboratory, we design materials from atom to application to tackle critical global challenges. Our primary research thrust focuses on developing functional thin films and nanomaterials to address the climate crisis, which we view as the defining challenge of our generation. Overcoming this crisis demands bold, creative efforts from scientists and engineers alike, and our work seeks to rise to this call.

We leverage scalable manufacturing techniques such as electrochemical synthesis, solution processing, and atmospheric pressure plasma methods to ensure our innovations are not only impactful but also deployable at scale. Our goal is to design materials that accelerate adoption curves, bridging the gap between laboratory breakthroughs and real-world solutions. To achieve this, we employ state-of-the-art characterization tools—including electron microscopy, x-ray scattering, and spectroscopic analysis—to unravel the structure of materials across atomic, microstructural, and macroscopic length scales. 

We are a brand new lab at the University of Kentucky, which means we are building! Through our research, we aim to contribute to a more sustainable future while inspiring and training the next generation of scientists and engineers. We have opportunities for undergraduate students, graduate students, and postdoctoral researchers. We will update this webpage regularly to keep you updated on our progress. Join us on our journey to innovate, collaborate, and make an impact!

Please contact Dr. Michael Hovish at michael.hovish@uky.edu for more information.

Principal Investigator - Dr. Michael Hovish

Horvish

Dr. Michael Hovish is a materials chemist specializing in the design of functional thin films and nanomaterials. He received his Bachelors from SUNY Albany, where he investigated solid-state memory storage devices under Prof. Nathaniel Cady. Dr. Hovish received his Masters and Doctoral degrees from Stanford University, working with Prof. Reinhold Dauskardt to design functional materials using highly scalable atmospheric pressure plasma processes. Following his PhD, Dr. Hovish led a research group in industry, driving innovation in clean energy technologies. Now, as a professor at the University of Kentucky, he leads the Hovish Research Laboratory, which focuses on designing functional thin films and nanomaterials to address the climate crisis. Through his work, he aims to contribute to a sustainable future while training the next generation of innovators.

Students

Tanikka Swope

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PhD Student

Kailee Barrett

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Undergraduate Student

Current Research

The HRL currently focuses on designing functional materials to advance the hydrogen economy, a critical pillar of the clean energy transition. Hydrogen offers immense potential as a sustainable energy carrier, capable of decarbonizing the power grid, the heavy industries, and transportation. To unlock this potential, we address key challenges in hydrogen generation, storage, and distribution. Leveraging our expertise in scalable manufacturing and advanced materials characterization, we are developing next-generation materials to improve the efficiency, durability, and scalability of hydrogen technologies, driving progress toward a sustainable, hydrogen-powered future. 

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Spray Plasma Processing of High Entropy Oxides

Spray Plasma Processing (SPP) combines the versatility of traditional solution processing techniques—such as spin-coating, spray-coating, dip-coating, and blade-coating—with the scalability and molecular-level control offered by atmospheric pressure plasma processing. In SPP, an ink of virtually any composition—ranging from metal salts to colloidal suspensions—is injected directly into an atmospheric pressure plasma discharge. By precisely controlling the ink and plasma chemistries, we can design and synthesize metals, oxides, polymers, and nanocomposite thin films with tailored properties.

Our current research focuses on using SPP to develop high entropy oxides (HEOs), an emerging class of materials that incorporate five or more cations into a single oxide lattice. These materials exhibit a remarkable range of properties, making them highly promising for applications such as oxygen reduction catalysts and advanced hydrogen barrier coatings. The high throughput and scalability of SPP uniquely position us to explore the vast compositional space of HEOs, overcoming one of the greatest challenges in leveraging their potential for real-world applications.

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Electrochemical Synthesis of Hydrogen Evolution Catalysts

Electrochemical synthesis (e.g., electroplating) is a highly scalable yet underutilized method for producing nanomaterials and nanocomposites. In our work, we harness these techniques to develop advanced hydrogen evolution catalysts, addressing critical challenges in catalyst stability and performance. A key focus is the design of single-atom catalysts supported on embedded nanowires. This innovative approach not only prevents catalyst agglomeration—a common issue that diminishes catalytic efficiency over time—but also enhances the mechanical properties of the system by integrating the catalysts into a robust nanocomposite structure.

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Electrolyte Speciation for PEM and Alkaline Electrolyzers

Our lab is investigating electrolyte speciation in PEM (proton exchange membrane) and alkaline electrolyzers using Surface-Enhanced Raman Spectroscopy (SERS). Understanding the speciation of ions and intermediates within these systems is critical for improving their efficiency, stability, and performance. By leveraging the high sensitivity and molecular specificity of SERS, we aim to gain deeper insights into the dynamic interactions at electrode-electrolyte interfaces. This knowledge will guide the optimization of electrolyzer designs and operating conditions, ultimately contributing to more efficient hydrogen generation technologies. 

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Publications

Publications, Conferences, Patents

2021 - 2024
Private Sector - Proprietary Materials

 

2020
M.Q. Hovish, N. Rolston, K. Bruening, F. Hilt, C.J. Tassone, R.H. Dauskardt. Crystallization kinetics of rapid spray plasma processed multiple cation perovskites in open air. J. Mater. Chem. A, 2020, 8, 169-176

Hilt, Florian, Hovish, Michael Q., Rolston, Nicholas, and Dauskardt, Reinhold H. Method for forming perovskite layers using atmospheric pressure plasma. United States: N. p., 2020


2019
M. Q. Hovish, F. Hilt, N. Rolston, Q. Xiao, R. H. Dauskardt, Open Air Plasma Deposition of Superhydrophilic Titania Coatings. Adv. Funct. Mater. 2019, 29, 1806421. https://doi.org/10.1002/adfm.201806421

 

2018
F. Hilt, M.Q. Hovish, N. Rolston, K. Bruening, C.J. Tassone, R.H. Dauskardt. Rapid route to efficient, scalable, and robust perovskite photovoltaics in air. Energy Environ. Sci., 2018,11, 2102-2113

R.H. Dauskardt, M.Q. Hovish, F. Hilt, N. Rolston, K. Bruening. Scalable and rapid spray plasma processing of single and multiple cation perovskites. 2018. Materials Research Society Spring Meeting.

N. Rolston, A. Printz, F. Hilt, M.Q. Hovish, R.H. Dauskardt, K. Bruening, C.J. Tassone, "Spray Plasma Processing of Barrier Films Deposited in Air for Improved stability of Flexible Electronic Devices," 2018 IEEE International Interconnect Technology Conference (IITC), Santa Clara, CA, USA, 2018, pp. 138-140, doi: 10.1109/IITC.2018.8430405.


2017
N. Rolston, A. Printz, F. Hilt, M.Q. Hovish, K. Bruening, C.J. Tassone, R.H. Dauskardt. Improved stability and efficiency of perovskite solar cells with submicron flexible barrier films deposited in air. J. Mater. Chem. A, 2017,5, 22975-22983

 

2016
M.Q. Hovish, R.H. Dauskardt. Optical properties of metal oxynitride thin films grown with atmospheric plasma deposition in air. 2016 J. Phys. D: Appl. Phys. 49 395302, DOI 10.1088/0022-3727/49/39/395302.

 

2015
R.H. Dauskardt, M.Q. Hovish, Atmospheric Plasma Deposition of Anti-Reflection Layers on Silicon in Open Air. American Vacuum Society. 62nd International Symposium

 

2012
J. O. Capulong, B. D. Briggs, S. M. Bishop, M. Q. Hovish, R. J. Matyi and N. C. Cady, "Effect of crystallinity on endurance and switching behavior of HfOx-based resistive memory devices," 2012 IEEE International Integrated Reliability Workshop Final Report, South Lake Tahoe, CA, USA, 2012, pp. 22-25, doi: 10.1109/IIRW.2012.6468907.

2011
B. D. Briggs, S. M. Bishop, J. O. Capulong, M. Q. Hovish, R. J. Matyi and N. C. Cady, "Comparison of HfOx-based resistive memory devices with crystalline and amorphous active layers," 2011 International Semiconductor Device Research Symposium (ISDRS), College Park, MD, USA, 2011, pp. 1-2, doi: 10.1109/ISDRS.2011.6135419.